Extend the Life of your Applied Materials Centura Ultima HDP-CVD
Advanced Energy has engineered RF replacement for original generators that are no longer offered and can no longer be serviced by the original manufacturers on your Applied Materials 200mm Centura Ultima high-density plasma chemical vapor deposition (HDP/CVD) tools. It utilizes two high-performance Paramount Plus generators and one Paramount generator combined with PowerInsight real-time data collection capability, providing the intelligence needed to monitor generator health and
Enhancing Yield in Semiconductor Epitaxy with Advanced Power and Temperature Control
Precision control is essential to maximize quality and yield in high-temperature manufacturing processes. In semiconductor epitaxy, failing to accurately measure and promptly respond to changes may result in crystal quality degradation, ultimately affecting reliability, performance, and yield.
This blog explores how the shift to advanced electrical heating and the invention of rapid-response Silicon Controlled Rectifier (SCR) power controllers enables these improvements in semiconductor epitaxy. Specifically, Advanced Energy’s latest generation of SCR power controllers (Thyro-XD™) were developed to deliver the industry’s highest accuracy (10X improvement from ±4.5% to ±0.25%), repeatability and fastest response time in highly dynamic high-temperature manufacturing processes.
Advanced Energy Launches High-Efficiency RF Power Rack for Mature Node Semiconductor Fabs
DENVER, Colo., September 18, 2025 — Advanced Energy Industries, Inc. (Nasdaq: AEIS), a global leader in highly engineered, precision power conversion, measurement and control solutions, launched the Opti™ RF power rack for legacy high-density plasma chemical vapor deposition (HDP-CVD) tools. Delivering over 70% system-level efficiency at full power, Opti reduces energy costs and improves uptime, compared to legacy systems.
“Fabs and OEMs looking to improve performance and yield of mature node 200 mm HDP-CVD equipment are under pressure to replace aging power racks with more efficient systems that can be maintained more easily,” said Brian Kowal, Advanced Energy’s vice president, Global Services. “Advanced Energy's Opti RF power rack will extend the life of legacy tools and reduce the energy consumption and carbon footprint of the fab.”
As semiconductor technology pushes toward Angstrom-scale geometries, precision and speed in plasma control have never been more critical. Advanced Energy’s NavX™ RF Matching Network represents a breakthrough in impedance matching — delivering ultra-fast, synchronized tuning designed for the rapid pulsing, frequent transitions, and complex process recipes of next-generation semiconductor manufacturing.
Featuring Advanced Selectable Tuning controls, the NavX™ system minimizes reflected power and optimizes plasma performance even in processes with shorter RF on times. When paired with the eVerest™ generator, it forms a complete, high-performance RF plasma power delivery system that sets a new standard for control and consistency.
At IES, we’re proud to support and collaborate with industry innovators like Advanced Energy, whose technologies help drive the future of semiconductor manufacturing forward.
Advanced Energy Unveils Mobile RF Power Optimization Solution
The Omni RF diagnostic cart ensures precise RF power delivery with IoT enabled data visualization and high accuracy RF sensors
Advanced Energy Industries, Inc. (Nasdaq: AEIS) – a global leader in highly engineered, precision power conversion, measurement and control solutions – announced the Omni™ RF diagnostic cart to verify delivered power from RF generators in critical semiconductor processes.
The Omni RF diagnostic cart integrates Advanced Energy’s 5540A RF power meter with PowerInsight by Advanced Energy®, an IoT enabled data ecosystem. A single RF sensor can be configured to accurately measure up to six different frequencies within the 0.2 to 200 MHz range. To reduce tool downtime and save on operational costs, PowerInsight’s intuitive interface helps users visualize, monitor, alert and track trends over time.
The next inflection in semiconductor technology requires ultra-fast, synchronized impedance matching for the rapid pulsing, frequent transitions, and longer recipes of next-gen processes. The NavX™ RF matching network redefines tuning speed, sophistication, and RF generator synchronization for exacting plasma control across the most complex pulsing profiles. Its groundbreaking Advanced Selectable Tuning controls allow accelerated processing for impedance matching to your chosen number of process pulse states.
Industrial Electric Furnaces: Cost Reduction with SCR Power Controllers
Silicon-controlled rectifier (SCR)-based power control modules (PCMs) for industrial furnaces need integrated features for precise temperature control, process reliability, product quality and cost-effectiveness.
Thermal processing control systems, such as the Rockwell Automation® Programmable Automation Controller, are fundamental to these operations. In addition, temperature measurement loops are required for control and shut-off. These are typically either thermocouples or pyrometers for harsh environments. Power control architectures that regulate energy input to furnace heaters via SCR power controllers are also essential.
Advanced Energy designs and manufactures highly engineered, precision power conversion, measurement, and control solutions for mission-critical applications and processes.
Not looking to buy new equipment? For a limited time only, you can take advantage of certified pre-owned equipment from Advanced Energy.
Certified to perform like new, our inventory enables superior process results at significant savings. Every unit is backed by a six-month whole-box warranty and undergoes:
Navigating the Complex Power Needs of Current and Next Generation CT Systems
Computed Tomography (CT) is a computerized imaging technique used in radiology. A rapidly rotating X-ray beam and detector are used to generate cross-sectional images – so-called slices – that form the volumetric and very detailed internal image of the body.
The external (visible) components of a CT scanner are the gantry, which includes a control panel, setup lasers and the bore along which the patient couch will traverse during the scan. While the idea of this imaging technique is more than 100 years old, it wasn’t until the early 1970s that sufficient computing power became reality. And although CT is now a very well-established and widely used diagnostic tool, there are still a lot of physics and engineering R&D activities being undertaken to improve and extend capabilities.
Currently the state-of-the-art detectors used in CT are energy integrating detectors (EID) but it looks like that
In the realm of semiconductor manufacturing, where precision and control are paramount, RF impedance matching networks play a critical role. These networks act as a bridge between the plasma source and the process chamber, optimizing power transfer and ensuring stable and efficient semiconductor processes.
This blog delves into the concept of impedance matching networks and explores their significance in semiconductor manufacturing. It demystifies the underlying principles, discusses key components and their limitations, and sheds light on how they contribute to maximizing the performance and reliability of semiconductor processes.
Impedance Matching Basics
Impedance is a measure of the opposition to the flow and to changes in alternating current (AC). It consists of two components: resistance (R) to measure the opposition to a flow of current and (X), reactance, to measure the opposition to a change in current due to the existence of an inductive or
