Advanced Energy

  1. Advanced Energy: Substrate Biasing for Sputter Deposition Processes

    Advanced Energy: Substrate Biasing for Sputter Deposition Processes

    Substrate biasing in sputter deposition processes is a critical technique for enhancing thin-film properties. The linked paper explores the principles and practices of substrate biasing, examining its impact on thin-film characteristics and the various methods used to achieve optimal results. It also discusses advanced biasing techniques and their applications, providing a comprehensive overview of the technology and its benefits in thin-film deposition.

    By integrating substrate biasing into deposition systems, greater control over film properties can be achieved, enabling the development of coatings with enhanced performance characteristics. Through this in-depth analysis, we aim to guide readers through the complexities of substrate biasing and offer valuable insights into its practical implementation with modern solutions from Advanced Energy.

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  2. Advanced Energy RF Fundamentals Training

    Advanced Energy RF Fundamentals Training

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  3. OPTI RF Power Rack from Advanced Energy – Extend your Applied Materials Life

    OPTI RF Power Rack from Advanced Energy

    Extend the Life of your Applied Materials Centura Ultima HDP-CVD

    Advanced Energy has engineered RF replacement for original generators that are no longer offered and can no longer be serviced by the original manufacturers on your Applied Materials 200mm Centura Ultima high-density plasma chemical vapor deposition  (HDP/CVD) tools. It utilizes two high-performance Paramount Plus generators and one Paramount generator combined with PowerInsight real-time data collection capability, providing the intelligence needed to monitor generator health and

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  4. Enhancing Yield in Semiconductor Epitaxy with Advanced Power and Temperature Control

    Enhancing Yield in Semiconductor Epitaxy with Advanced Power and Temperature Control

    Precision control is essential to maximize quality and yield in high-temperature manufacturing processes. In semiconductor epitaxy, failing to accurately measure and promptly respond to changes may result in crystal quality degradation, ultimately affecting reliability, performance, and yield.
     
    This blog explores how the shift to advanced electrical heating and the invention of rapid-response Silicon Controlled Rectifier (SCR) power controllers enables these improvements in semiconductor epitaxy. Specifically, Advanced Energy’s latest generation of SCR power controllers (Thyro-XD™) were developed to deliver the industry’s highest accuracy (10X improvement from ±4.5% to ±0.25%), repeatability and fastest response time in highly dynamic high-temperature manufacturing processes.
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  5. Advanced Energy Launches High-Efficiency RF Power Rack for Mature Node Semiconductor Fabs

    Advanced Energy Launches High-Efficiency RF Power Rack for Mature Node Semiconductor Fabs

    DENVER, Colo., September 18, 2025 — Advanced Energy Industries, Inc. (Nasdaq: AEIS), a global leader in highly engineered, precision power conversion, measurement and control solutions, launched the Opti™ RF power rack for legacy high-density plasma chemical vapor deposition (HDP-CVD) tools. Delivering over 70% system-level efficiency at full power, Opti reduces energy costs and improves uptime, compared to legacy systems. 

    “Fabs and OEMs looking to improve performance and yield of mature node 200 mm HDP-CVD equipment are under pressure to replace aging power racks with more efficient systems that can be maintained more easily,” said Brian Kowal, Advanced Energy’s vice president, Global Services. “Advanced Energy's Opti RF power rack will extend the life of legacy tools and reduce the energy consumption and carbon footprint of the fab.”

    The rack integrates Paramount 13.56 MHz and

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  6. Unleash the Power: NavX™ RF Matching Network

    Unleash the Power: NavX™ RF Matching Network

    As semiconductor technology pushes toward Angstrom-scale geometries, precision and speed in plasma control have never been more critical. Advanced Energy’s NavX™ RF Matching Network represents a breakthrough in impedance matching — delivering ultra-fast, synchronized tuning designed for the rapid pulsing, frequent transitions, and complex process recipes of next-generation semiconductor manufacturing.

    Featuring Advanced Selectable Tuning controls, the NavX™ system minimizes reflected power and optimizes plasma performance even in processes with shorter RF on times. When paired with the eVerest™ generator, it forms a complete, high-performance RF plasma power delivery system that sets a new standard for control and consistency.

    At IES, we’re proud to support and collaborate with industry innovators like Advanced Energy, whose technologies help drive the future of semiconductor manufacturing forward.

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  7. Advanced Energy Unveils Mobile RF Power Optimization Solution

    Advanced Energy Unveils Mobile RF Power Optimization Solution

    The Omni RF diagnostic cart ensures precise RF power delivery with IoT enabled data visualization and high accuracy RF sensors

    Advanced Energy Industries, Inc. (Nasdaq: AEIS) – a global leader in highly engineered, precision power conversion, measurement and control solutions – announced the Omni™ RF diagnostic cart to verify delivered power from RF generators in critical semiconductor processes.

    The Omni RF diagnostic cart integrates Advanced Energy’s 5540A RF power meter with PowerInsight by Advanced Energy®, an IoT enabled data ecosystem. A single RF sensor can be configured to accurately measure up to six different frequencies within the 0.2 to 200 MHz range. To reduce tool downtime and save on operational costs, PowerInsight’s intuitive interface helps users visualize, monitor, alert and track trends over time.
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  8. Unleash the Power: NavX™ RF Matching Network

    Unleash the Power: NavX™ RF Matching Network

    The next inflection in semiconductor technology requires ultra-fast, synchronized impedance matching for the rapid pulsing, frequent transitions, and longer recipes of next-gen processes. The NavX™ RF matching network redefines tuning speed, sophistication, and RF generator synchronization for exacting plasma control across the most complex pulsing profiles. Its groundbreaking Advanced Selectable Tuning controls allow accelerated processing for impedance matching to your chosen number of process pulse states.
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  9. Industrial Electric Furnaces: Cost Reduction with SCR Power Controllers

    Industrial Electric Furnaces: Cost Reduction with SCR Power Controllers

    Silicon-controlled rectifier (SCR)-based power control modules (PCMs) for industrial furnaces need integrated features for precise temperature control, process reliability, product quality and cost-effectiveness.

    Thermal processing control systems, such as the Rockwell Automation® Programmable Automation Controller, are fundamental to these operations. In addition, temperature measurement loops are required for control and shut-off. These are typically either thermocouples or pyrometers for harsh environments. Power control architectures that regulate energy input to furnace heaters via SCR power controllers are also essential.

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  10. IES & Advanced Energy - Certified Used Equipment

    Certified Used Equipment from Advanced Energy

    Advanced Energy designs and manufactures highly engineered, precision power conversion, measurement, and control solutions for mission-critical applications and processes.

    IES Technical Sales is a preferred partner of Advanced Energy and supplies to customers throughout the northeast.


    Not looking to buy new equipment? For a limited time only, you can take advantage of certified pre-owned equipment from Advanced Energy.

    Certified to perform like new, our inventory enables superior process results at significant savings. Every unit is backed by a six-month whole-box warranty and undergoes:

    • Functional testing
    • Component repair or replacement (when required)
    • Tuning and calibration
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