Inductively Coupled Plasma (ICP) Sources
Inductively Coupled Plasma (ICP) Sources
The CCR Technology COPRA RF-ICP Plasma Beam Technology based on its inductively coupled 13,56 MHz excitation. Scalable from R&D to more or less any kind of industrial production scale the COPRA´s unrivaled characteristics allows one to work with constant basic plasma parameters. This means that your process result is not negatively affected by scaling in this and speed as long as the right power level is adjusted. The COPRA RF-ICP sources are working gas independent, reliable and maintenance poor. This makes them perfectly suited to full-fill your process and application needs. The Standard COPRA delivers a high ion current (ICD) at constantly low ion energies (IE) which can be easily controlled and adjusted if needed. The always integrated RF-Matching-Network as well as the possibility of customization and freedom of scalability completes our portfolio.
Models
Round Plasma Source
The COPRA Round Plasma Sources (DN-Series) enables to process wafer sized substrates. The precise control of Ion Energy at different power levels coupled with high Ion current density enable intelligent control of process related energies. The customizable design of these COPRA Round Plasma Sources facilitate particle poor thermal stable and stress less etching and deposition. The COPRA Round Plasma Sources (DN-Series) are key components in wafer-sized semiconductor or in the precision optics productions and are easily scalable to serve customized dimensional needs.
Linear Plasma Source
The COPRA Linear Plasma Sources (LS-Series) are Plasma PVD-Assist as well as direct PECVD Plasma Sources for box, R2R & inline coater setup´s. Different configuration types enable adequate choice of gas types, appropriate PVD-Assist functions and-/or direct PECVD depostion as well as chemcial etching. Due to their excellent homogenous distribution of the Ion current densities these sources are Large Area capable. The COPRA Linear Plasma Sources can work with nearly all types of gases and reach dissociation degrees of up to 90% with plasma densities >1x10-12 cm3. The COPRA Linear Plasma Sources are easily scalable to serve customized dimensional needs.
Ring Plasma Source
Large Area PECVD high throughput source solutions for industrial coating markets. The COPRA Ring Plasma Sources (RS-Series) robust design is industrial proven and due to its lowest maintenance costs in particular suited for longer coating campaigns. The RS-Source Series are scalable to serve customized dimensional needs. The Design of the COPRA Ring Plasma Sources paired with the unique features of the COPRA Plasma Technology® can cover substrate widths of more than 3 meter by mounting several RS-Sources InLine one beside the other.
Built-In Plasma Source
The COPRA Built In Plasma Sources (IS-Series) have been developed for the precision optical coating segment. The Special design allows you to place the source fully in the vacuum chamber and enables low energy Ion assisted deposition (IBAD) by using one source for calotte-/dome sizes of up to 2.2 meter. These E-Gun/E-Beam assisting source types can run with pure gases and drive down significantly your maintenance costs. The IS-Series are hybrid PVD/PECVD capable. This means you can run the PVD Assist and the PECVD with the same source as f.e. DLC coatings for Optics.
