Plasma Power Sources
Plasma Power Sources
The Advanced Energy Plasma power supplies are direct current (DC) and radio frequency (RF) devices used in plasma generation equipment for applications such as sputtering, plasma etching, physical vapor deposition (PVD) coating, and chemical vapor deposition (CVD) coating.
A plasma power supply can be an RF power supply or a DC power supply. An RF power supply can provide high power density and can eliminate the need for front-end DC-to-DC conversion components. Applications include plasma-based thin film processes for semiconductor, flat panel display, or data storage (DVD) manufacturing.
A DC power supply delivers increased throughput, which is an important consideration for demanding PVD applications such as flat panel displays.
Models
DC Power Source Systems
DC generator provides performance and reliability required in dual-magnetron sputtering applications. Arcs are actively managed, versus a generic pre-set arc response. Primary/secondary for high power applications and higher power levels with reduced arc damage
Low and Mid-Frequency Power
Low and Mid-Frequency power sources have an unprecedented power-delivery ease and control for dual-magnetron sputtering, enabling precise tuning of film characteristics. With selectable frequency, regulation mode, and duty cycle, as well as low stored energy and simplified, modular system configuration. Cost-effective, scalable, and versatile, it minimizes complexity, increases quality, and boosts throughput to enable advanced process innovation.
Pulsed DC Systems
Pulsed-DC Systems extend your ability to optimize output with advanced pulse shaping, as well as four-block progressive arc management that includes full voltage reversal and self-adjusting arc parameters. This compact solution’s patented pulsing technology proactively inhibits arcs, while its wide operational range unlocks material options to extend single- and dual-magnetron process flexibility and material innovation.
RF Match Networks
Standard units are optimizedfor applications that have well understood impedances yet require fast, reliable auto-tuning.
RF Plasma Generators
The RF Plasma Sources facilitate advanced process development. It combines accurate, repeatable power delivery with an inherently flexible digital architecture, wide output coverage, and a comprehensive feature set design for robust and reliable operation in any manufacturing or research environment.
