Thin Film Deposition
Thin Film Deposition
Thin film deposition is the process of creating and depositing thin film coatings onto a substrate material. We represent comapnies such as Advanced Energy, Gencoa, and Telemark. These coatings can be made of many different materials, from metals to oxides to compounds. Thin film coatings also have many different characteristics which are leveraged to alter or improve some element of the substrate performance. For example, some are transparent; some are very durable and scratch-resistant; and some increase or decrease the conductivity of electricity or transmission of signals.
Thin film deposition is an important manufacturing step in the production of many opto-electronic, solid state and medical devices and products, including consumer electronics, semiconductor lasers, fiber lasers, LED displays, optical filters, compound semiconductors, precision optics, microscopy & microanalysis sample slides, and medical implants. There are a few different technologies and methods that can be used to apply thin film coatings, and an array of tools and equipment that can be used to streamline or enhance the thin film deposition process.
There is no one-size-fits-all, perfect thin film deposition system or method. Your technique and configuration of choice depends on the performance and production requirements that are unique to your application.
Types of Thin Film Deposition Equipment
Plasma Power Supplies
Plasma power supplies are direct current (DC) and radio frequency (RF) devices used in plasma generation equipment for applications such as sputtering, plasma etching, physical vapor deposition (PVD) coating, and chemical vapor deposition (CVD) coating.
Magnetron Sputtering
Rectangular and rotatable magnetrons offering a large choice of magnetic options are complemented by the range of ion sources for pre-cleaning, and process tools such as the powerful Speedflo process controller and Optix sensor.
Inductively Coupled Plasma (ICP) Sources
These sources are working gas independent, reliable and maintenance poor. This makes them perfectly suited to full-fill your process and application needs. The Standard ICP source delivers a high ion current (ICD) at constantly low ion energies (IE) which can be easily controlled and adjusted if needed.
Surface Treatment
The PVA TePla Plasma Pen is a handheld, compact atmospheric plasma device designed for precision surface treatment applications. It generates a focused stream of ionized gas at ambient pressure, enabling localized cleaning, activation, and functionalization of various materials such as metals, plastics, and glass. The Plasma Pen is particularly useful for laboratory, R&D, and small-scale production environments where flexibility and targeted treatment are required.
CoolClean
Cool Clean Technologies provides precision CO2 cleaning that utilizes recycled carbon dioxide. Recycled CO2 is an excellent cleaning media for the removal of contaminants, such as solvents, oils, particulate matter, coolant, dust and more from a variety of substrates and devices. CO2 cleaning equipment is typically placed directly into the manufacturing lines of semiconductor wafers, sensitive media, displays, automotive parts, fiber optic components, medical devices, optics, and much more.
