As semiconductor technology pushes toward Angstrom-scale geometries, precision and speed in plasma control have never been more critical. Advanced Energy’s NavX™ RF Matching Network represents a breakthrough in impedance matching — delivering ultra-fast, synchronized tuning designed for the rapid pulsing, frequent transitions, and complex process recipes of next-generation semiconductor manufacturing.

Featuring Advanced Selectable Tuning controls, the NavX™ system minimizes reflected power and optimizes plasma performance even in processes with shorter RF on times. When paired with the eVerest™ generator, it forms a complete, high-performance RF plasma power delivery system that sets a new standard for control and consistency.

At IES, we’re proud to support and collaborate with industry innovators like Advanced Energy, whose technologies help drive the future of semiconductor manufacturing forward.

Learn more about the NavX™ RF Matching Network:

This content was originally published to Advanced Energy.

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