In ion implantation in the semiconductor industry, ions are applied to and introduced into substrates such as wafers (doping, introduction of controlled defects, etc.) to achieve a targeted change in the properties of the base material and/or the already applied layers.
Adenso offers customized Implanter.Modules (IMP) as part of the modular VAC.ROBOTICS platform, enabling customers to easily and quickly build new end stations/implanter systems and apply and develop new ion implantation technologies.
For new ion implantation processes such as superjunction technologies for SiC (silicon carbide) MOSFETs up to 3.3 kV, Adenso's compact implanter modules, already proven in industrial series production, are ideally suited for high-volume manufacturing, especially in combination with the SubstrateScanner solutions for precise scanning movements of the SiC substrates/wafers in the ion beam. A unique selling point is the availability of Adenso's
The WHM WaferHandling Module, developed by Adenso, features a central vacuum chamber and an integrated WHR WaferHandling Robot, optimized for handling substrates/carriers in high vacuum. Our WHM WaferHandling Module operates completely autonomously, is space-saving, and can be easily docked to your existing process stations – your vacuum cluster system is ready to use!
WHR WaferHandling.Robot – the basis for handling and automation
The WHR wafer handling robot is the core of Adenso's modular VAC.ROBOTICS platform. The Adenso WHR handles sensitive and large-area substrates in the field of vacuum robotics (industrial vacbot) and is optimized for maximum payload and long reach. Its simple arm geometry allows for small gate valves and compact handling swivel ranges.
Your advantages at a glance:
REACH: Largest travel distances – maximum flexibility
