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Thin Film and Plasma

  1. 3 Apr

    Kalrez® Perfluorelastomers: How to Select the Right Compound

    Selecting the right Kalrez® Compound

    Kalrez® was the first high performance perfluoroelastomer designed for plasma, high temperature, and wet process applications, and was introduced in the 1970s. Many users think of Kalrez® in a similar way we have all come to think of “Kleenex®” – that is – as a generic product and just about any type of Kalrez® will be OK. However, there are now many versions (“compounds”) of Kalrez® based on the intended application, and the differences are substantial.

    The table below is a great starting point,

    Read more »
    April 03, 2024
    Vacuum , Temperature , Thin Film and Plasma , Dupont Kalrez
  2. 5 Mar

    Why Emissivity Compensation is Important When Using an Optical Pyrometer

    Emmissivity Compensation and the Importance of Pyrometers

    If you are measuring the temperature of a static surface, whether or not its temperature is changing, all is good. But what happens when you are changing the surface and its emissivity is also changing? Your pyrometer inaccuracy can increase substantially.

    The solution? Emissivity compensation.

    Read more »
    March 05, 2024
    Temperature , Thin Film and Plasma
  3. 6 Dec

    Product Overview - Hine Automation's Vertically Mounted LL, SL-300T

    SL-300T by Hine Automation

    Vertical-Mounted Wafer Handling Load Locks 

    Hine Automation’s automated load lock designs eliminate the need to vent and evacuate the OEMs process chamber prior to each process cycle. These wafer-handling load locks offer various levels of functionality and integration and, until recently, have been exclusively horizontally mounted.

    An Expectation of Higher Performance 

    Hine’s Vertically Mounted LL, SL-300T places the wafer inside the tool from the top, simplifying the loading process. However, because the motion is vertical rather than horizontal,

    Read more »
    December 06, 2023
    Thin Film and Plasma , Hine Automation
  4. 18 Oct

    IES Tech Sales Partners with Innovent Technologies, LLC

    IES Tech Sales Partners with Innovent Technologies

    IES Tech Sales is excited to announce a new partnership with Innovent Technologies, LLC, a specialized contract manufacturer known for their excellence in assembling and testing semiconductor manufacturing tools and equipment. This collaboration marks a significant milestone in providing enhanced services and high-quality products to clients in various industries, such as Semiconductors, Optics, Medical, Life Science, Nanotechnology, and R&D.

    Read more »
    October 18, 2023
    Vacuum , Thin Film and Plasma , IES News
  5. 30 Aug

    What Products Can Be Used For Plasma Engineering?

    Plasma is ubiquitous in nature. Plasma is an ionised gas made up of charged particles formed by heating a gas to high temperatures where atoms start colliding, and the electrons are knocked off. Most of the known matter in the universe is in the plasma state.

    Scientific developments in the field of plasma science have enabled the use of plasma in a wide range of plasma engineering applications such as plasma etching and deposition of semiconductor chips, biomedical, plasma surface modification, material processing, compact x-ray lasers, power production from thermonuclear fusion, TV screens, catalysis, thermonuclear synthesis, space propulsion, hydrogen production, and treatment of industrial emissions.

    Such an extensive range of plasma engineering applications offers tremendous possibilities for advanced high-end products. In this blog post, we look at the various products that Hiden Analytical offers for various plasma engineering applications.

    Hiden’s plasma

    Read more »
    August 30, 2023
    Thin Film and Plasma , Hiden Analytical
  6. 17 Aug

    Hine Automation Delivers DLP-300 EFEM – Increases Throughput Capacity, Minimizes Downtime

    Custom Engineering to Address Heat Requirements and Substrate Size

    Hine Automation consistently exceeds expectations for quality and versatility in design and manufacturing. Unlike other limited off-the-shelf solution providers, Hine challenges itself to develop customized solutions when required to optimize throughput and minimize downtime.

    A market leader in Rapid Thermal Processing approached Hine Automation with a need to improve its current efficiencies, which included the handling of substrates processed at temperatures exceeding 1000 degrees Celsius. Wafers processed at extreme temperatures pose a variety of handling and throughput difficulties, Hine’s expertise was leveraged to maximize the customer’s substrate yield utilizing the Hine DLP-300.

    The customer required two separate cooling stations to stage material coming out of their process chambers as the processed material was still too hot to be placed back in the Load Ports. Additionally, the customer requested

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    August 17, 2023
    Vacuum , Thin Film and Plasma , Principal , Hine Automation
  7. 7 Aug

    Dupont Kalrez® Seals for Semiconductor Processing

    Kalrez O-Rings from IES for Semiconductor Applications

    Purity is critical to high wafer yield, and Kalrez® seals are designed with properties that help reduce contamination from particulates, outgassing and extractables. Semiconductor Processing Seals

    Kalrez® seals for semiconductor processing are field-proven in the manufacture of semiconductor chips.

    They can help extend planned maintenance intervals, and thereby lower long-term cost of ownership, in a wide range of semiconductor processes. 

    Read more »
    August 07, 2023
    Vacuum , Temperature , Thin Film and Plasma , Dupont Kalrez
  8. 27 Jul

    Using Residual Gas Analysis in Semiconductor Production

    A residual gas analyser (RGA) is a crucial piece of equipment known as a mass spectrometer used in many industries to conduct high-sensitivity, real-time analysis. Gas analysers allow analysts to maintain a high level of quality control and gas monitoring by identifying the composition and quality of residual gases and vapour species. This post will examine why residual gas analysis is used in semiconductor production.

    Semiconductor Production

    Semiconductors are vital for digital products that help us communicate with people around the world. These are commonly used to make electronic chips, which are used in computer components and other electronic devices such as medical devices, smartphones and applications for the Internet of Things (IoT). However, as the demand for better technology grows, the need for high-quality semiconductors will also increase, and their processes will need to become more streamlined.

    Gases are used throughout the many stages of the semiconductor

    Read more »
    July 27, 2023
    Thin Film and Plasma , Metrology and Analysis , Hiden Analytical
  9. 22 Oct

    Kalrez® FFKM Parts Reduce Wafer Contamination

    Kalrez Helps Reduce Wafer Contamination

    Perfluoroelastomers (FFKMs) are used as seals on wafer processing equipment due to their extraordinary resistance to chemicals, including reactive plasmas and extreme heat as high as 327°C.  FFKM performance can vary depending upon the chemical composition. Specially formulated Kalrez® products may be required to help reduce wafer contamination.

    Read more »
    October 22, 2021
    Vacuum , Thin Film and Plasma
  10. 26 Feb

    Semiconductor Vacuum Sealing Considerations When Using Ammonia (NH3)

    Semiconductor thin film processing equipment typically utilizes a variety of sealing materials, depending on the application. FKM (e.g. Viton®), Buna, and Silicone are examples of commonly used materials that are widely available and relatively inexpensive. In limited cases a sealing application can be addressed with FVMQ (Fluorosilicone) or ‘High Performance FKM’ materials. The most demanding applications, such as aggressive gas plasmas or wet chemistries, or high temperatures, usually require an FFKM material, such as Kalrez®. FFKM seals are compatible with a wide range of chemicals, can hold up under temperatures as high as 327°C, and can resist aggressive plasma attack.

    Thin film processes using ammonia, such as HDPCVD, SACVD, ALD, and FCVD are appropriate for the use of FFKM seals. However, even within the FFKM seals class, there are specific formulations that perform more favorably, so it is best to seek a recommendation

    Read more »
    February 26, 2020
    Vacuum , Thin Film and Plasma
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