IES Tech Sales is excited to announce a new partnership with Innovent Technologies, LLC, a specialized contract manufacturer known for their excellence in assembling and testing semiconductor manufacturing tools and equipment. This collaboration marks a significant milestone in providing enhanced services and high-quality products to clients in various industries, such as Semiconductors, Optics, Medical, Life Science, Nanotechnology, and R&D.
Plasma is ubiquitous in nature. Plasma is an ionised gas made up of charged particles formed by heating a gas to high temperatures where atoms start colliding, and the electrons are knocked off. Most of the known matter in the universe is in the plasma state.
Scientific developments in the field of plasma science have enabled the use of plasma in a wide range of plasma engineering applications such as plasma etching and deposition of semiconductor chips, biomedical, plasma surface modification, material processing, compact x-ray lasers, power production from thermonuclear fusion, TV screens, catalysis, thermonuclear synthesis, space propulsion, hydrogen production, and treatment of industrial emissions.
Such an extensive range of plasma engineering applications offers tremendous possibilities for advanced high-end products. In this blog post, we look at the various products that Hiden Analytical offers for various plasma engineering applications.
Purity is critical to high wafer yield, and Kalrez® seals are designed with properties that help reduce contamination from particulates, outgassing and extractables. Semiconductor Processing Seals
Kalrez® seals for semiconductor processing are field-proven in the manufacture of semiconductor chips.
They can help extend planned maintenance intervals, and thereby lower long-term cost of ownership, in a wide range of semiconductor processes.
A residual gas analyser (RGA) is a crucial piece of equipment known as a mass spectrometer used in many industries to conduct high-sensitivity, real-time analysis. Gas analysers allow analysts to maintain a high level of quality control and gas monitoring by identifying the composition and quality of residual gases and vapour species. This post will examine why residual gas analysis is used in semiconductor production.
Semiconductors are vital for digital products that help us communicate with people around the world. These are commonly used to make electronic chips, which are used in computer components and other electronic devices such as medical devices, smartphones and applications for the Internet of Things (IoT). However, as the demand for better technology grows, the need for high-quality semiconductors will also increase, and their processes will need to become more streamlined.
Gases are used throughout the many stages of the semiconductor
Perfluoroelastomers (FFKMs) are used as seals on wafer processing equipment due to their extraordinary resistance to chemicals, including reactive plasmas and extreme heat as high as 327°C. FFKM performance can vary depending upon the chemical composition. Specially formulated Kalrez® products may be required to help reduce wafer contamination.
Semiconductor thin film processing equipment typically utilizes a variety of sealing materials, depending on the application. FKM (e.g. Viton®), Buna, and Silicone are examples of commonly used materials that are widely available and relatively inexpensive. In limited cases a sealing application can be addressed with FVMQ (Fluorosilicone) or ‘High Performance FKM’ materials. The most demanding applications, such as aggressive gas plasmas or wet chemistries, or high temperatures, usually require an FFKM material, such as Kalrez®. FFKM seals are compatible with a wide range of chemicals, can hold up under temperatures as high as 327°C, and can resist aggressive plasma attack.
Thin film processes using ammonia, such as HDPCVD, SACVD, ALD, and FCVD are appropriate for the use of FFKM seals. However, even within the FFKM seals class, there are specific formulations that perform more favorably, so it is best to seek a recommendation
Doug Pelleymounter, a Senior Applications Engineer with Advanced Energy ("AE") who focused mostly on high power PVD applications, has just announced his well-earned retirement after 22 years of service. This is a (mostly verbatim) re-post of Doug's story, from which a lot of practical knowledge can gained by anyone involved in vacuum thin film coating.
From Doug:
I’ve been asked to put not just 22 but over 40 years in the thin film industry into perspective, point out what I think have been significant innovations as well as steady drivers of development, and maybe even pass on a little advice.
To start, let’s turn the clock back to the 1980s, when I was first getting involved with sputter deposition, coating processes, and process
Here is what's new at IES Technical Sales related to Plasma and Thin-Film products and services. Please check back from time to time for updates.
Advanced Energy Industries:
[Updated 2021-10]:
Retrofits are available for the following products:
The Suib Group at the University of Connecticut collaborated with Hiden Analytical to determine the effectiveness of Hiden’s Compact SIMS (Secondary Ion Mass Spectroscopy) Analysis System for various research applications, including:
For the detailed experiment findings, click here.
You can extend service life of ISO-KF seals in high temperature applications by switching from generic fluoroelastomers (FKM) such as Viton, to perfluoroelastomers (FFKM), and by ensuring the seal is properly sized.
ISO-KF (or ISO-QF or ISO-NW) type flange seals provide an economical, convenient and simplified means of constructing vacuum systems. However, despite the efficiency offered by these flanges, you may face premature seal failure and unscheduled equipment downtime when standard AS-568A o-rings are specified for locations which will be exposed to >/= 150°C and/or harsh process effluent, particularly in heated forelines and exhaust lines.
NW Series perfluoroelastomer
