Here is what's new at IES Technical Sales related to Plasma and Thin-Film products and services. Please check back from time to time for updates.
Advanced Energy Industries:
[Updated 2021-10]:
Retrofits are available for the following products:
- APEX RF Power Supplies --> Paramount
- Atlas 2012 RF Power Supplies --> Paramount
- FTMS RF Matching Networks --> Navigator II
- HFV-3kW and HFV-5kW RF Power Supplies --> Paramount
- MDX DC Magnetron Power Supplies (MDX-5K, MDX-10K) --> Pinnacle
- MDXII 15kW and 30kW DC Power Supplies --> Pinnacle
- MDX-L DC Magnetron Power Supplies (MDX-L 6K, MDX-L 12K, MDX-L 18K) --> Pinnacle
- MFA Stinger and RF Matching Networks --> Navigator
- OR2000 Temperature Measurement --> OR4000
- PDX 8000 Mid-Frequency Power Supplies --> Paramount MF
- PDW2200 Mid-Frequency Power Supplies --> Paramount MF
- Pinnacle I and II DC Power Supplies --> Pinnacle III
- Rapid F --> Xstream
- RFG RF Power Supplies (RFG-1250, RFDS-1250, RFG-2K/2V, RFG-300x, RFG-5500) --> APEX or Paramount
- SPARC-le and SPARC-le V DC Pulsing Accessories --> Pinnacle Plus+ power platforms
[Posted 2021-10]:
Advanced Energy’s MAXstream™ line is the next generation of remote plasma sources for chamber cleaning. With flow capabilities of 3 to 12 standard liters per minute (SLPM) and industry-leading power accuracy, MAXstream™ RPS provides a compact solution for chamber clean, and with AE’s proven RPS reliability and long life trouble-free operation.
Related plasma source products: Litmas™, Rapid OX™, Xstream™
[Posted 2020-07]:
Advanced Energy introduces PowerInsight™, data-driven decision making enabled by the Industrial Internet of Things (IIoT). PowerInsight™ transforms the data recorded by your power delivery systems into useable insights, through rich data sets and advanced analytics, that you can apply to your process to maximize performance, cut costs, and improve yield. Designed to complement your existing systems, the focused power delivery diagnostics can enable higher level big data analytics and AI solutions. Unlock
AE’s decades of domain expertise and service experience to make data-driven decisions in your process.
[Posted 2018-11]
The Xstream™ RPS (Remote Plasma System) is now available in the U.S. for new applications and as a retrofit option for the Rapid-F RPS.
CCR Technology
[Updated 2021-10]
IES Technical Sales is pleased to announce a new partnership with CCR Technologies of Troisdorf, Germany, maker of the COPRA® family of plasma sources for PECVD, PVD Assist, Etching, Cleaning, Activation, and PALD Assist applications.
- Round: wafer processing up to 12" substrates, plasma assist in PVD coaters, ALD enhancement, plasma activation and cleaning.
- Linear: roll to roll web coating, dynamic PECVD on flexible substrates, PVD assist and PECVD batch processing.
- Ring: Flat panel PECVD, Dynamic PECVD on large substrates, PVD assist and PECVD batch processing.
- Built-in: E-beam assist, web processing, direct DLC for optics.
Gencoa
[Posted 2019-01]
A patent application relating to the autotuner feature of the Speedflo Reactive Sputter Process Controller was granted by the U.S. Patent Office in early January 2019 (Patent no. 10168672). The autotuner is a fast and effective procedure for generating the optimum controller parameters for reactive sputtering processes by using advanced inverse dynamics algorithms to analyze data collected during the system identification procedure.
PVA TePla America
[Posted 2019-04]
PVA TePla has recently introduced a new single wafer RF Asher,
Model IoN-10V. The company is accepting sample requests from customers willing to send in wafers for processing.
Telemark:
[Posted 2019-05]:
Telemark announces a new 270-degree electron beam source emitter with improved Arc Resistance. The new design incorporates improved insulator shielding to resist arcing, allowing for longer filament lifetime, better process stability, and improved film quality (view photo).
[Posted 2018-08]:
The "Eagle" Digital Programmable Sweep has replaced the discontinued "Cheetah" model.
