Optix For Vacuum Heat Treatment and Vacuum Metallurgy
Gencoa Optix is a robust and easy-to-use compact gas sensor that provides critical information from vacuum environments. Optix is ideally suited to improving productivity and preventing failed production cycles on vacuum metallurgy and heat treatment processes.
Optical Gas Sensing
Optix is a robust and easy to use device to track the gases present during vacuum processing. The nature of a vacuum means that any potential problem can be identified by monitoring the different gases present.
In contrast to in-vacuum mass spectrometry-based gas detectors, Optix uses light from a small remote plasma on the chamber wall to detect the gas concentrations. The detector (spectrometer) is located in atmosphere, and therefore protected from damage at all times.
Another major advantage is the ability to work from near atmosphere down to 10-7 mbar, without the need for any differential pumping. As the chamber pressure
Gencoa Optix 3.0 Brings Next-Generation Vacuum Gas Analysis
Optix is a multi-purpose instrument for rapid gas sensing in any vacuum environment, functioning through a wide range of operating pressures to cater for most industrial vacuum production processes without any requirement for a differential pumping system unless atmospheric sampling.
Separated from chemicals by an optical window, Optix uses a remote plasma spectroscopy concept which generates a small plasma within the sensor head. A built-in spectrometer analyzes the plasma, automatically interpreting the light spectrum to provide quantitative measurement of the presence and concentration of gas within the vacuum.
The Optix spectral information and sophisticated back-end software creates a range of uses for a wide range of applications, including contaminating processes involving hydrocarbons, solvents and long-chain polymers.
Small changes are made to the device in the case of sensing CVD
Vacuum applications tend to be extremely high spec, with certain aspects being beyond compromise. Pumps and vessels must be of high integrity, with the ability to achieve the appropriate level of vacuum without leaks. In this article, we outline some of the key ways of measuring gas leak detection.
Why is Gas Leak Detection Important
Gas leak detection in pressurized and vacuum systems is a fundamental step in the manufacturing process. Maintaining and quantifying the leak tightness of vessels during service, is rarely prioritized which can have serious consequences.
Measurement of leaks is known as the leak rate, a number which is dependent on many factors from the pressure differential to the size of the holes. This rate refers to the amount of the leak that enters or leaves the enclosure per unit of time.
Gas leak detection is an important part of producing high quality products and ensuring quality control. There
Optix is a multi-purpose and highly robust instrument for gas sensing in any vacuum environment. Optix caters for most industrial vacuum production processes without any requirement for a differential pumping system, providing automatic operation and real-time species detection.
KEY FEATURES OF THE OPTIX
1. Partial pressure measurement of vacuum gases
2. Wide pressure range, operating directly at process pressures from 0.5 to 10-7mbar
3. No filaments and low maintenance
4. Chemically-tolerant with dedicated version for ALD processes
Antimicrobial Protection to Reduce Hospital Associated Infections
Hospital Associated Infections (HAI) are the most common complication of hospital care and one of the top 10 leading causes of death in the USA as reported by The Agency for Healthcare Research and Quality [1]. The most common pathogens (Enterococcus faecium, Staphylococcus aureus, Klebsiella pneumoniae, Acinetobacter baumannii, Pseudomonas aeruginosa, and Enterobacter spp), commonly known as the ESKAPE pathogens, are the leading causes of HAIs. Contracting a HAI can often lead to increased morbidity and can have a devastating effect on physical, mental, and financial health.
In addition to this, HAIs cost the healthcare system billions of dollars a year in added expenditure. Recent research suggests that a growing number of HAIs are caused by pathogens that have become resistant to the antimicrobial medications typically used to control them. [2] The US Center for Disease Control and
Magnetron sputtering is a form of deposition technology that employs a gaseous plasma and kinetic energy to create a flux of ‘sputtered’ material used to coat surfaces under vacuum. The high-energy ions present in a magnetron sputtering plasma bombard the surface of the target (source material) and liberated atoms by the sputtering process to create this vapour cloud. The vapour moves through the vacuum area, depositing onto a substrate surface to create a thin film covering.
Standard Sputtering Processes
Standard sputter deposition processes (non-magnetically enhanced) involve a chamber evacuated to a high vacuum to decrease the partial pressure of background gases. Once the base pressure has been attained, a sputtering gas such as argon is introduced into the chamber and a pressure control system is employed to regulate the total pressure. [1]
A high negative voltage (-0.5 to -3 kV) is applied to the cathode
Perfect your reactive processes with Speedflo, an advanced reactive feedback control system delivering improvements to deposition rates, coating properties and process reliability. Speedflo is designed around the demands of real processes and has been proven on hundreds of different industrial plasma-based deposition machines – each with varying demands.
With two options available – offering a choice of 8 channels for Speedflo, or 3 channels for Speedflo Mini – Speedflo has the flexibility to benefit a wide range of reactive processes, from magnetron
