Gencoa Optix 3.0 Brings Next-Generation Vacuum Gas Analysis
Optix is a multi-purpose instrument for rapid gas sensing in any vacuum environment, functioning through a wide range of operating pressures to cater for most industrial vacuum production processes without any requirement for a differential pumping system unless atmospheric sampling.
Separated from chemicals by an optical window, Optix uses a remote plasma spectroscopy concept which generates a small plasma within the sensor head. A built-in spectrometer analyzes the plasma, automatically interpreting the light spectrum to provide quantitative measurement of the presence and concentration of gas within the vacuum.
The Optix spectral information and sophisticated back-end software creates a range of uses for a wide range of applications, including contaminating processes involving hydrocarbons, solvents and long-chain polymers.
Small changes are made to the device in the case of sensing CVD
Enhanced efficiency, improved quality, and unmatched consistency in producing ultra-bright broadband laser-driven light sources for advanced scientific applications.
The client was actively seeking a local manufacturing partner to optimize their operations and drive greater efficiency. Their existing production strategy involved a hybrid approach, utilizing both in-house resources and a contract manufacturer located in the Midwest. However, this setup presented challenges in coordination, lead times,
Thin Film Technology: RF Power Delivery Troubleshooting Basics
RF power is commonly used to create a plasma for film deposition or chamber cleaning. The most common frequency is 13.56 MHz; but 30 kHz to 300 MHz (AC), and 2, 4, 27, 40, and 60 MHz are also employed. To go higher, thin film related applications most commonly jump to microwave at 2.7GHz.
RF can be challenging at any frequency; but at 13.56 or above it is particularly so. If you get a fault alarm or an indication there is something wrong, many users take the shortest time approach and replace the power supply, and/or the tuning network (a.k.a. "RF match" or "matching network"), assuming the problem lies with one or the other.
As semiconductor technology pushes toward Angstrom-scale geometries, precision and speed in plasma control have never been more critical. Advanced Energy’s NavX™ RF Matching Network represents a breakthrough in impedance matching — delivering ultra-fast, synchronized tuning designed for the rapid pulsing, frequent transitions, and complex process recipes of next-generation semiconductor manufacturing.
Featuring Advanced Selectable Tuning controls, the NavX™ system minimizes reflected power and optimizes plasma performance even in processes with shorter RF on times. When paired with the eVerest™ generator, it forms a complete, high-performance RF plasma power delivery system that sets a new standard for control and consistency.
At IES, we’re proud to support and collaborate with industry innovators like Advanced Energy, whose technologies help drive the future of semiconductor manufacturing forward.
The company was looking for a strategic partner to validate their groundbreaking ALD process. They needed a business ally who could convert their proof-of-concept laboratory tool into a reliable and reproducible electromechanical manufactured product.
Manufacturing Challenge
Stringent Timeline - Implement efficient processes to complete the project within a limited timeframe.
Constrained Budget - Manage project costs effectively by optimizing resource allocation to stay within budget.
Design and Development - Create a sophisticated yet reliable process machine that ensures consistent deposition results
High-Stakes Environment - Operate within an industrial context where reliability is critical, minimizing the risk associated with equipment failure.
How Much Can You Save by Changing To A Closed-Loop System?
Water is one of the most precious resources on the planet, yet it is often overlooked in industrial and laboratory cooling applications. While tap water may seem like an inexpensive and convenient option for cooing, it carries hidden costs – both financial and environmental. Even if a business isn’t directly paying for its water usage, excessive consumption places unnecessary strain on local water supplied and infrastructure. As water conservation becomes an increasingly critical issue, industries must rethink how they use water, particularly in cooling processes.
A closed cooling system, such as a chiller or an airblast cooler, provides
How Plasma Cleaning Ensures Superior Adhesion Across Industries
Plasma Cleaning
Microscopic contaminations not visible to the naked eye are found on all surfaces. Almost always, these contaminants must be removed as a first step to producing faultless adhesion between surfaces when working in the application of glueing, printing, painting, bonding, or coating.
Plasma Cleaning Functional Principles
Plasma cleaning technology offers solutions for any type of contamination, for any substrate. In the cleaning process, molecular level contamination residues are removed from a surface by a dry method of turning the foreign materials into a gas. This process of changing the state of a solid or smearable liquid into a gas without exposing the part to a liquid is preferred over standard cleaning methods.
With a plasma cleaner there are virtually no limitations for materials that can be treated. Polymers (solid or fibers), metals, rubbers, ceramics and glass are
Advanced Energy Unveils Mobile RF Power Optimization Solution
The Omni RF diagnostic cart ensures precise RF power delivery with IoT enabled data visualization and high accuracy RF sensors
Advanced Energy Industries, Inc. (Nasdaq: AEIS) – a global leader in highly engineered, precision power conversion, measurement and control solutions – announced the Omni™ RF diagnostic cart to verify delivered power from RF generators in critical semiconductor processes.
The Omni RF diagnostic cart integrates Advanced Energy’s 5540A RF power meter with PowerInsight by Advanced Energy®, an IoT enabled data ecosystem. A single RF sensor can be configured to accurately measure up to six different frequencies within the 0.2 to 200 MHz range. To reduce tool downtime and save on operational costs, PowerInsight’s intuitive interface helps users visualize, monitor, alert and track trends over time.
Kalrez® Spectrum™ 7075 resists aggressive fluids at high temperatures and saves costs in clamping systems
Aggressive Hydraulic Fluids vs Kalrez®
A leading manufacturer of heavy duty clamping systems for metals, plastics and rubber processing switched to DuPont™ Kalrez® Spectrum™ 7075 perfluoroelastomer parts to seal its hydraulic clamp range, with the goal of ensuring long-term resistance to highly aggressive Oemeta HF/DU hydraulic fluids at 482°F.
Other sealing solutions used in the same environment had to be replaced due to failure after only a few months, while Kalrez® Spectrum™ 7075 seals from DuPont have been in place for well over a year and a half to-date without problems. Since refitting with Kalrez®, the company was able to significantly extend the service intervals of the pressure cylinders,
The NeoDry G Series of dry vacuum pumps is the newest addition to the Kashiyama pump product line. The Neodry G Series contains a wide voltage range and is quieter with temperature optimation through its fan control. There is a serial communication port whih allows for data communication and speed control. Additionally, there's an IEC power connector for more convenient power options, all while boasting an upgraded water vapor evacuation performance.
There are currently 4 models in the NeoDry G Series lineup ranging from a maximum pumping speed of 110 L/min up to 600 L/min. IES has a robust inventory of Kashiyama G-Series Pumps in-stock in our Massachusetts warehouse, ready to ship. We can deliver within 5 business days from the acceptance of your order!
