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DuPont™ Kalrez® 8085 for Semiconductor Processes
DuPont™ Kalrez® 8085 perfluoroelastomer parts are a beige, general purpose product for “select” etch, ash/strip and deposition processes. It has been formulated for minimal particle generation in NF3 plasma. Kalrez® 8085 exhibits very low particle generation and low weight loss in oxygen and fluorine-based plasmas, has excellent mechanical strength and is well-suited for both static and dynamic sealing applications (e.g., bonded slit valve doors, bonded gate valves, bonded pendulum valves, gas orifice seals, gas feedthrough seals, chamber lid seals, etc.) A maximum continuous service temperature of 240°C is suggested. Kalrez® 8085 can also withstand short-term excursions to 275 °C. Ultrapure post-cleaning and packaging is standard for all Kalrez® 8085 parts.
Performance Features of Kalrez® 8085
- Very low particle generation in NF3 plasma
- Excellent mechanical strength properties
- Longer seal life
- Reduced PM time and increased equipment uptime
- Lower cost of ownership
Suggested Applications for Kalrez® 8085
- Bonded slit valve door seals
- Bonded gate valves
- Chamber lid seals
- Gas inlet seals
- Gas orifice seals
- Gas feedthrough seals
Fabs Choose Kalrez® 8085 for Improved Performance
Kalrez® 8085 has been reported to significantly improve wafer production in a variety of semiconductor plasma process applications where oxygen and fluorinated plasmas are used during the cleaning cycle.
In a number of evaluations at fabline customers, Kalrez® 8085 exhibited improved mechanical strength, lower particle generation and longer seal life compared to competitive perfluoroelastomer parts in both static and dynamic sealing applications.
Case Report #3137 — DuPont™ Kalrez® 8085 Reported to Reduce Particle Adders by 53% Over Competitive Perfluoroelastomer (FFKM A11)
- HDPCVD O-ring
- Process chemistry: Silane
- Cleaning chemistry: NF3, O2 and O3
- Competitive FFKM generated significantly more particle adders

Case Report #4115 — Kalrez® 8085 Extended Seal Life 100% versus Competitive Perfluoroelastomer (FFKM A18)
- PECVD RPS cleaning module O-ring seals
- Process chemistry: SiH4, O2
- Cleaning chemistry: NF3
- Competitive perfluoroelastomer failed due to severe plasma attack, i.e., erosion, cracking, etc.
Case Report #6553 — Kalrez® 8085 Improved Wafer Production over 25% versus Competitive Perfluoroelastomer (FFKM A2)
- PECVD gas box, shower head and plate seal
- Process chemistry: TEOS, O2 at 400 °C
- Cleaning chemistry: NF3 plasma at 3500 watts
- Competitive perfluoroelastomer failed due to cracking and excessive leakage
Case Report #2883 — Kalrezâ 8085 Extended Seal Life 100% versus Competitive Perfluoroelastomer (FFKM A2)
- Ash isolation valve poppet seal
- Process chemistry: O2, CF4
- Cleaning chemistry: N/A
- Competitive perfluoroelastomer failed due to cracking and excessive leakage
