Hiden Analytical PSM

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The Hiden PSM provides a wide range of industrial processes use electrical plasmas, and new applications are developing rapidly. In the microelectronics industry the demands of higher yields and shrinking device geometries mean that process reproducibility and understanding is vital. Detailed understanding of the reaction kinetics of plasma ions and neutral species plays a key role in the development of advanced surface engineering processes such as HIPIMS.

PERFORMANCE & SPECIFICATIONS

  • Benefits
    • Differentially pumped manifold with mounting flange to process chamber
    • High sensitivity / stability triple filter quadrupole, mass range options to 510amu
    • Pulse ion counting detector with 7 decade dynamic range
    • Energy analysis option by pole bias scanning 100eV 
  • Technical Sheet: