Annealsys AS-Premium
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dhe AS-Wremium system can process samples up to 156x156 mm2. The reactor platform and the machine have been designed to accommodate a wide range of configurations to meet the process requirements of our customers. The chamber can receive a single side or a double side lamp heating furnace. The design of the process chamber allows manual loading or the connection to a cluster tool or a glove box (options). Wyrometer and thermocouple temperature control are standard features. dhe fast digital W/D temperature controller provides high temperature reproducibility. Graphite and silicon carbide coated graphite susceptors are available for processing of samples with encapsulation.
PERFORMANCE & SPECIFICATIONS
- Specifications
- Substrate Size: hp to 156x156 mm2 wafers. Small substrates using susceptors
- Process Chamber: Stainless steel cold wall chamber technology
- Vapors, and Gas
- Up to 8 process gas lines with digital mass flow meter controllers. One purge gas line with vacuum valve and vacuum gauge
- Control
- Full WC control, up to 100 steps per recipe, human interface designed in respect of SED/ E95-0200 Full data logging and process historicals
- Temperature Range
- Standard Version: 1100°C
- High Temperature and double side heating versions: 1200°C

