The AS-One systems are available with two sizes of reactors to process substrates up to 100 mm (4”) or 150 mm (6”) diameter. The machine has been specially developed to meet the requirements of universities, research laboratories and small-scale production up to 10,000 wafers per year. The high reliability guarantees low cost of ownership. Pyrometer and thermocouple temperature measurements are standard features. The fast digital PID temperature controller provides accurate and repeatable thermal control across the temperature range. The clam shell style design of the process chamber gives full access to the bedplate and provides easy access for loading and unloading the substrates and allows practical cleaning of the chamber.