Annealsys MC-100 Direct Liquid Injection Deposition System
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The Annealsys MC-100 system is a 100 mm DLICVD/ DLI-ALD reactor developed for research and development applications. The process chamber double configuration makes possible to perform CVD and ALD processes inside the same process chamber. The Direct Liquid Injection (DLI) vaporizers provide perfect control of precursor flow and allow utilization of low vapor pressure and diluted chemical precursors. The fast switching of the precursor vapor flows associated with the by-pass valve provide perfect interface control for deposition of nanolaminates. The automated liquid panel has been optimized for reduced consumption of chemical precursors. The no dead volume design provides full rising capability for easy change of chemicals and refilling of the precursor tanks in a glove box.
PERFORMANCE & SPECIFICATIONS
- Specifications
- Substrate Size: Up to 100 mm diameter
- Process Chamber: Stainless steel thermalized process chamber. Rotating substrate holder for enhanced process uniformally
- Vapors, Gas, and Vacuum
- Up to 4 direct liquid injection vaporizers. State of the art liquid panels with full rising capabilities. Up to 8 process gas lines with digital mass flow controllers. Vacuum valve, vacuum gauge and automatic pressure control
- Control
- Full PC control, up to 400 operations or loops per recipe Human interface designe in respect of SEMi E95-0200 full data loggin and process historicals
- Temperature Range
- From room temperature up to 800°C