Annealsys MC-050 All in one DLI system
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The Annealsys MC-050 system is a 2-inch DLI-CVD / DLI-ALD reactor developed to meet the requirements of research and development units. The infrared lamp furnace in association with the direct liquid injection vaporizers provide unique multi process capabilities inside the same process chamber: CVD, ALD, MOCVD, RTP and RTCVD. The Direct Liquid Injection (DLI) vaporizers provide perfect control of precursor flow and allow utilization of low vapor pressure and diluted chemical precursors. The fast switching of the precursor vapor flows associated with the by-pass valve provide perfect interface control for deposition of nanolaminates. The MC-050 is the perfect machine for the development of new materials and nanolaminates using the widest range of solid and liquid organometallic precursors.
PERFORMANCE & SPECIFICATIONS
- Specifications
- Substrate Size: Up to 2-inch diameter
- Process Chamber: Quartz tube with water cooled stainless steel flanges. Infrared lamp heating system. Counter tube for easy cleaning of the process chamber
- Vapors, Gas, and Vacuum
- Up to 6 direct liquid injection vaporizers. State of the art liquid panels with full rising capabilities. Up to 8 process gas lines with digital mass flow controllers. Vacuum valve, vacuum gauge and automatic pressure control
- Control
- Full PC control, up to 400 operations or loops per recipe Human interface designe in respect of SEMi E95-0200 full data loggin and process historicals
- Temperature Range
- From room temperature up to 1100°C