Gencoa Circular Vtech
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The Gencoa Circular VTech range is available for target diameters of 2" to 6" and allow the magnetic properties over the target surface to be changed by simple external adjustment, which can be performed during the process or between deposition runs.
PERFORMANCE & SPECIFICATIONS
- Benefits
- Unbalance: Variable degree of unbalance to adjust the electron release and the level of ion bombardment of the growing film
- Balance: To reduce the additional energy input to the growing film and substrate and produce low bombardment conditions
- Field Strength: To vary the magnetic field strength in order to adjust the discharge voltage and current. This can be used to compensate for the change in discharge voltage as the sputter target erodes