The Ion Current Monitor (ICM) provides REAL TIME Monitoring of Ion Flux throughout ion assisted deposition processes. The Ion Current Monitor provides essential deposition information for most ion-based process. The ICM monitors the flux of positive ions and outputs the beam current in units of amps per square centimeter. Three amplifier ranges are provided to adequately cover the flux density output from a wide range of commercially available ion beam sources. An adjustable bias voltage is provided to reject negatively charged particles (electrons).