The CCR Technology COPRA IS201-G(I)R(PE) Built In Plasma Source have been designed for Plasma ion-assisted deposition (PIAD) in PVD applications at low temperatures in order to achieve: higher atomic or molecular packing density in the thin-film layers (increasing index of refraction), minimizations of wavelength shift, and higher adhesion and lowest absorption levels. Those performance requirements are in particularly crucial for the production of Smart devices: AR coatings/Hard coatings, and LED: DBR reflector layer coatings. Lightning: Dichroic color filters/Beam splitters/Reflector coatings. Medical: Filter and mirror technologies for controlled heat and lightning conditions. Communication technology: AR coatings/Band pass filters. Precision optics: Microlithography(EUV/DUV), Laser optics and Mirror coatings, Camera lens coatings, and night vision and distance control, Microscope and telescopes. The COPRA IS201-G(I)R(PE) Built In Plasma Source all typical energy ranges required to assist the typical evaporating materials and cover calotte or dome sizes up to 760 mm. Easy to install and renowned to be maintenance poor they contribute to optimize your coating costs. No arcing and spikes on substrates and/or films, No filament and no electron emission grid needed! Variable RF-power independent ion energy settings allow to perform your film with the exact energy values you will need preventing surface damages and stress build-up.