Advanced Energy UV 400 and UVR 400
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Advanced Energy's UV 400 and UVR 400 pyrometers directly measure wafer surface temperature. This improved method allows more accurate control of the wafer temperature leading to improved yield. The UVR 400 includes an additional reflectometer at 635 nm with 0.5 kHz measurement speed. This enables you to enable measure deposition thickness. These systems set a new standard for LED production processes. Results show a reliable correlation between process temperature and final product wavelength.
PERFORMANCE & SPECIFICATIONS
- Benefits
- Improve yield via accurate true wafer temperature measurement
- Measure temperature directly on the GaN layer using UV wavelength instrumentation
- Capturing real-time reflectance measurement using a fast pulsing light source
- Prevent residue temperature oscillation as seen in NIR emissivity-compensated
- Take advantage of the highest quality optics with excellent rejection of stray light
- Features
- Reliable wafer temperature with PL wavelength correlation
- Analog output and RS485 with UPP protocol
- Adjustable subrange within the temperature range
- Device withstands an atmosphere of nitrogen and a vacuum (< 10 mbar)
- Complete solution for reactor temperature control with PhotriX and concentric lightpipe options
- Technical Sheets