The COPRA IS502-EGIRPE Built In Plasma Source have been designed for Plasma ion-assisted deposition (PIAD) in PVD applications at low temperatures in order to achieve: higher atomic or molecular packing density in the thin-film layers (increasing index of refraction), minimizations of wavelength shift, and higher adhesion and lowest absorption levels. The COPRA IS502-EGIRPE Built In Plasma Source cover all typical energy ranges required to assist the typically used evaporating materials for optics. They are used for calotte or dome sizes up to 2000 mm. Easy to install and renowned to be maintenance poor they contribute to optimize your coating costs. No arcing and spikes on substrates and/or films, no filament and no electron emission grid needed! Variable RF-power independent ion energy settings allow to perform your film with the exact energy values you will need preventing surface damages and stress build-up.