The CCR Technology COPRA DN251 Round Plasma Source, 3kW RF-ICP is a flange mounted solution for substrate sizes of up to 6" and can be powered up to 3kW. This source type do have excellent E-Gun or Sputter-Assist, Cleaning/Activation and DLC coating capabilities. The ease of generation of atomic species of the gases you run through the COPRA DN251 Round Plasma Source is highly appreciated for state of the art PVD Assist requirements. The COPRA plasma source solutions are scalable. In many cases the process developments made with our smaller source solutions are being transferred on substrates of larger dimensions by using the COPRA plasma sources for larger substrate sizes which are completing our RF-ICP plasma source solution portfolio.