Electron Beam Sources
Electron Beam Sources
IES has invested significant effort to ensure the best beam geometry and performance of our sources. The Telemark small research sources and large production sources contain the very best in magnetic design and build quality. The strict attention to magnetic design improves material usage and ensures high film repeatability. 270⁰ beam deflection design is used on all Telemark sources and is state-of-the-art in ebeam technology. This ensures long filament life and longer run times before servicing.
IES also offers complete ebeam sources mounted on to flanges for easy installation and servicing. Our Engineers are happy to discuss the best options for your application and mounting needs.
Models
Regular E-Beam Sources
Uses grease lubricated ball bearings for a pump that is small, lightweight, and low cost. The shock resistant design enables the turbo molecular pump to be mounted on moving equipment or moving parts. The product lineup offers models from 50 L/s to 2400 L/s.
UHV E-Beam Sources
For the highest purity thin films, ultra-high vacuum or near ultra-high vacuum environments are necessary. Some of the applications are MBE, surface analysis, mono-layer and high other high purity film needs. IES has a complete line of ebeam sources (e-gun) for these applications.
