Assembly, Mini UHV Ion Source

The Mini UHV 500W Gridless End-Hall Ion Source has been specially developed to provide a cost effective solution for ion assisted processes for small to medium sized UHV deposition systems. The source provides an extremely reliable and maintenance-free 500W source for many applications in PVD processes. The compact design and rugged construction allows easy installation to both new and existing UHV vacuum deposition systems.
Source Diameter: 1.86" x 2.74"
Beam Power: selectable to 225 volts; anode power 500 W
Anode Current: 5 amps
Gas Flow: 7sccm argon required to produce 2 amps (typical)