The 750 Ion Source is a gridless End-Hall that have been specially developed to provide a cost effective solution for ion assisted vacuum processes from small to large sized deposition systems. The sources provide an extremely reliable and maintenance-free up to 3kW source for many applications in PVD processes. The compact design and rugged construction allows easy installation to both new and existing vacuum deposition systems.
Source Diameter: 2.48" x 2.53"
Beam Power: selectable to 225 volts; anode power 750 W
Anode Current: 5 amps
Gas Flow: 7sccm argon required to produce 2 amps (typical)