This is a re-post of an article authored by Dave Christie of Advanced Energy Industries, first posted on November 11, 2014.
The waveform produced by the Ascent DMS was designed intentionally to overcome the challenge of delivering high power through an industrially realistic cable, considering length and inductance. The waveform, shown in the figure below, has an initial voltage boost segment, or pulse. The effect of the boost pulse is to create fast current rise, to effectively approximate a current square wave. This enables delivery of high powers required for industrial dual magnetron sputtering (DMS) processes, often in the range of 100 kW to 150 kW, or even higher. The effectiveness of our approach was first proven in our own industrial-grade dual magnetron sputtering system, followed by tens of field installations globally.
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